Search results for: Nanosphere lithography
Commenced in January 2007
Frequency: Monthly
Edition: International
Paper Count: 13

Search results for: Nanosphere lithography

13 Profile Controlled Gold Nanostructures Fabricated by Nanosphere Lithography for Localized Surface Plasmon Resonance

Authors: Xiaodong Zhou, Nan Zhang

Abstract:

Localized surface plasmon resonance (LSPR) is the coherent oscillation of conductive electrons confined in noble metallic nanoparticles excited by electromagnetic radiation, and nanosphere lithography (NSL) is one of the cost-effective methods to fabricate metal nanostructures for LSPR. NSL can be categorized into two major groups: dispersed NSL and closely pack NSL. In recent years, gold nanocrescents and gold nanoholes with vertical sidewalls fabricated by dispersed NSL, and silver nanotriangles and gold nanocaps on silica nanospheres fabricated by closely pack NSL, have been reported for LSPR biosensing. This paper introduces several novel gold nanostructures fabricated by NSL in LSPR applications, including 3D nanostructures obtained by evaporating gold obliquely on dispersed nanospheres, nanoholes with slant sidewalls, and patchy nanoparticles on closely packed nanospheres, all of which render satisfactory sensitivity for LSPR sensing. Since the LSPR spectrum is very sensitive to the shape of the metal nanostructures, formulas are derived and software is developed for calculating the profiles of the obtainable metal nanostructures by NSL, for different nanosphere masks with different fabrication conditions. The simulated profiles coincide well with the profiles of the fabricated gold nanostructures observed under scanning electron microscope (SEM) and atomic force microscope (AFM), which proves that the software is a useful tool for the process design of different LSPR nanostructures.

Keywords: Nanosphere lithography, localized surface plasmonresonance, biosensor, simulation.

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12 Vertical Micromirror Fabrication by X-ray Lithography for Single Mode Optical Fiber Switching Applications

Authors: R. Chimchang, R. Tongta, R. Phatthanakun

Abstract:

Inthis paper, design and fabrication of vertical micromirror for optical switching applications of single mode optical fibers are proposed. The structure of micromirror will be created from negative photoresist (SU-8) on X-ray lithography using X-ray from synchrotron light source. The properties of X-ray from synchrotron light source are high-energy electrons which can construct materials that have a high aspect ratio. In addition, the technique of gold coating of reflective material has been used for change direction of light between two pairs of optical fibers. At a wavelength of 1310 nm with minimum average loss of 5.305 dB is obtained.

Keywords: vertical micromirror, negative photoresist, X-ray lithography

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11 Surface Plasmon Polariton Excitation by a Phase Shift Grating

Authors: T. Nakada, Y. Nakagawa, M. Haraguchi, T. Okamotoi, M. Flockert, T. Isu, G. Shinomiya

Abstract:

We focus on the excitation and propagation properties of surface plasmon polariton (SPP). We have developed a SPP excitation device in combination with a grating structures fabricated by using the scanning probe lithography. Perturbation approach was used to investigate the coupling properties of SPP with a spatial harmonic wave supported by a metallic grating. A phase shift grating SPP coupler has been fabricated and the optical property was evaluated by the Fraunhofer diffraction formula. We have been experimentally confirmed the induced stop band by diffraction measurement. We have also observed the wavenumber shift of the resonance condition of SPP owing to effect of a phase shift.

Keywords: Surface Plasmon Polariton, phase shift grating, scanning probe lithography

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10 Fabrication of Microfluidic Device for Quantitative Monitoring of Algal Cell Behavior Using X-ray LIGA Technology

Authors: J. Ruenin, S. Sukprasong, R. Phatthanakun, N. Chomnawang, P. Kuntanawat

Abstract:

In this paper, a simple microfluidic device for monitoring algal cell behavior is proposed. An array of algal microwells is fabricated by PDMS soft-lithography using X-ray LIGA mold, placed on a glass substrate. Two layers of replicated PDMS and substrate are attached by oxygen plasma bonding, creating a microchannel for the microfluidic system. Algal cell are loaded into the microfluidic device, which provides positive charge on the bottom surface of wells. Algal cells, which are negative charged, can be attracted to the bottom of the wells via electrostatic interaction. By varying the concentration of algal cells in the loading suspension, it is possible to obtain wells with a single cell. Liquid medium for cells monitoring are flown continuously over the wells, providing nutrient and waste exchange between the well and the main flow. This device could lead to the uncovering of the quantitative biology of the algae, which is a key to effective and extensive algal utilizations in the field of biotechnology, food industry and bioenergy research and developments.

Keywords: Algal cells, microfluidic device, X-ray LIGA, X-ray lithography, metallic mold, synchrotron light, PDMS

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9 Advanced Micromanufacturing for Ultra Precision Part by Soft Lithography and Nano Powder Injection Molding

Authors: Andy Tirta, Yus Prasetyo, Eung-Ryul. Baek, Chul-Jin. Choi , Hye-Moon. Lee

Abstract:

Recently, the advanced technologies that offer high precision product, relative easy, economical process and also rapid production are needed to realize the high demand of ultra precision micro part. In our research, micromanufacturing based on soft lithography and nanopowder injection molding was investigated. The silicone metal pattern with ultra thick and high aspect ratio succeeds to fabricate Polydimethylsiloxane (PDMS) micro mold. The process followed by nanopowder injection molding (PIM) by a simple vacuum hot press. The 17-4ph nanopowder with diameter of 100 nm, succeed to be injected and it forms green sample microbearing with thickness, microchannel and aspect ratio is 700μm, 60μm and 12, respectively. Sintering process was done in 1200 C for 2 hours and heating rate 0.83oC/min. Since low powder load (45% PL) was applied to achieve green sample fabrication, ~15% shrinkage happen in the 86% relative density. Several improvements should be done to produce high accuracy and full density sintered part.

Keywords: Micromanufacturing, Nano PIM, PDMS micro mould.

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8 Experimental Study of Tunable Layout Printed Fresnel Lens Structure Based on Dye Doped Liquid Crystal

Authors: M. Javadzadeh, H. Khoshsima

Abstract:

In this article, we present a layout printing way for producing Fresnel zone on 1294-1b doped liquid crystal with Methyl-Red azo dye. We made a Fresnel zone mask with 25 zones and radius of 5 mm using lithography technique. With layout printing way, we recorded mask’s pattern on cell with λ=532 nm solid-state diode pump laser. By recording Fresnel zone pattern on cell and making Fresnel pattern on the surface of cell, odd and even zones, will form. The printed pattern, because of Azo dye’s photoisomerization, was permanent. Experimentally, we saw focal length tunability from 32 cm to 43 cm.

Keywords: Liquid crystal, lens, Fresnel zone, diffraction, Fresnel lens.

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7 An Enhanced Slicing Algorithm Using Nearest Distance Analysis for Layer Manufacturing

Authors: M. Vatani, A. R. Rahimi, F. Brazandeh, A. Sanati nezhad

Abstract:

Although the STL (stereo lithography) file format is widely used as a de facto industry standard in the rapid prototyping industry due to its simplicity and ability to tessellation of almost all surfaces, but there are always some defects and shortcoming in their usage, which many of them are difficult to correct manually. In processing the complex models, size of the file and its defects grow extremely, therefore, correcting STL files become difficult. In this paper through optimizing the exiting algorithms, size of the files and memory usage of computers to process them will be reduced. In spite of type and extent of the errors in STL files, the tail-to-head searching method and analysis of the nearest distance between tails and heads techniques were used. As a result STL models sliced rapidly, and fully closed contours produced effectively and errorless.

Keywords: Layer manufacturing, STL files, slicing algorithm, nearest distance analysis.

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6 Numerical Analysis and Design of Dielectric to Plasmonic Waveguides Couplers

Authors: Emanuela Paranhos Lima, Vitaly Félix Rodríguez Esquerre

Abstract:

In this work, efficient directional coupler composed of dielectric waveguides and metallic film has been analyzed in details by simulations using finite element method (FEM). The structure consists of a step-index fiber with dielectric core, silica cladding, and a metal nanowire parallel to the core. The results show that an efficient conversion of optical dielectric modes to long range plasmonic is possible. Low insertion losses in conjunction with short coupling length and a broadband operation can be achieved under certain conditions. This kind of couplers has potential applications for the design of photonic integrated circuits for signal routing between dielectric/plasmonic waveguides, sensing, lithography, and optical storage systems. A high efficient focusing of light in a very small region can be obtained.

Keywords: Directional coupler, finite element method, metallic nanowire, plasmonic, surface plasmon polariton.

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5 A Simple Chemical Precipitation Method of Titanium Dioxide Nanoparticles Using Polyvinyl Pyrrolidone as a Capping Agent and Their Characterization

Authors: V. P. Muhamed Shajudheen, K. Viswanathan, K. Anitha Rani, A. Uma Maheswari, S. Saravana Kumar

Abstract:

In this paper, a simple chemical precipitation route for the preparation of titanium dioxide nanoparticles, synthesized by using titanium tetra isopropoxide as a precursor and polyvinyl pyrrolidone (PVP) as a capping agent, is reported. The Differential Scanning Calorimetry (DSC) and Thermo Gravimetric Analysis (TGA) of the samples were recorded and the phase transformation temperature of titanium hydroxide, Ti(OH)4 to titanium oxide, TiO2 was investigated. The as-prepared Ti(OH)4 precipitate was annealed at 800°C to obtain TiO2 nanoparticles. The thermal, structural, morphological and textural characterizations of the TiO2 nanoparticle samples were carried out by different techniques such as DSC-TGA, X-Ray Diffraction (XRD), Fourier Transform Infra-Red spectroscopy (FTIR), Micro Raman spectroscopy, UV-Visible absorption spectroscopy (UV-Vis), Photoluminescence spectroscopy (PL) and Field Effect Scanning Electron Microscopy (FESEM) techniques. The as-prepared precipitate was characterized using DSC-TGA and confirmed the mass loss of around 30%. XRD results exhibited no diffraction peaks attributable to anatase phase, for the reaction products, after the solvent removal. The results indicate that the product is purely rutile. The vibrational frequencies of two main absorption bands of prepared samples are discussed from the results of the FTIR analysis. The formation of nanosphere of diameter of the order of 10 nm, has been confirmed by FESEM. The optical band gap was found by using UV-Visible spectrum. From photoluminescence spectra, a strong emission was observed. The obtained results suggest that this method provides a simple, efficient and versatile technique for preparing TiO2 nanoparticles and it has the potential to be applied to other systems for photocatalytic activity.

Keywords: TiO2 nanoparticles, chemical precipitation route, phase transition, Fourier Transform Infra-Red spectroscopy, micro Raman spectroscopy, UV-Visible absorption spectroscopy, Photoluminescence spectroscopy, Field Effect Scanning Electron Microscopy.

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4 Nano-Texturing of Single Crystalline Silicon via Cu-Catalyzed Chemical Etching

Authors: A. A. Abaker Omer, H. B. Mohamed Balh, W. Liu, A. Abas, J. Yu, S. Li, W. Ma, W. El Kolaly, Y. Y. Ahmed Abuker

Abstract:

We have discovered an important technical solution that could make new approaches in the processing of wet silicon etching, especially in the production of photovoltaic cells. During its inferior light-trapping and structural properties, the inverted pyramid structure outperforms the conventional pyramid textures and black silicone. The traditional pyramid textures and black silicon can only be accomplished with more advanced lithography, laser processing, etc. Importantly, our data demonstrate the feasibility of an inverted pyramidal structure of silicon via one-step Cu-catalyzed chemical etching (CCCE) in Cu (NO3)2/HF/H2O2/H2O solutions. The effects of etching time and reaction temperature on surface geometry and light trapping were systematically investigated. The conclusion shows that the inverted pyramid structure has ultra-low reflectivity of ~4.2% in the wavelength of 300~1000 nm; introduce of Cu particles can significantly accelerate the dissolution of the silicon wafer. The etching and the inverted pyramid structure formation mechanism are discussed. Inverted pyramid structure with outstanding anti-reflectivity includes useful applications throughout the manufacture of semi-conductive industry-compatible solar cells, and can have significant impacts on industry colleagues and populations.

Keywords: Cu-catalyzed chemical etching, inverted pyramid nanostructured, reflection, solar cells.

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3 Energy Deposited by Secondary Electrons Generated by Swift Proton Beams through Polymethylmethacrylate

Authors: Maurizio Dapor, Isabel Abril, Pablo de Vera, Rafael Garcia-Molina

Abstract:

The ionization yield of ion tracks in polymers and bio-molecular systems reaches a maximum, known as the Bragg peak, close to the end of the ion trajectories. Along the path of the ions through the materials, many electrons are generated, which produce a cascade of further ionizations and, consequently, a shower of secondary electrons. Among these, very low energy secondary electrons can produce damage in the biomolecules by dissociative electron attachment. This work deals with the calculation of the energy distribution of electrons produced by protons in a sample of polymethylmethacrylate (PMMA), a material that is used as a phantom for living tissues in hadron therapy. PMMA is also of relevance for microelectronics in CMOS technologies and as a photoresist mask in electron beam lithography. We present a Monte Carlo code that, starting from a realistic description of the energy distribution of the electrons ejected by protons moving through PMMA, simulates the entire cascade of generated secondary electrons. By following in detail the motion of all these electrons, we find the radial distribution of the energy that they deposit in PMMA for several initial proton energies characteristic of the Bragg peak.

Keywords: Monte Carlo method, secondary electrons, energetic ions, ion-beam cancer therapy, ionization cross section, polymethylmethacrylate, proton beams, secondary electrons, radial energy distribution.

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2 Overview of Multi-Chip Alternatives for 2.5D and 3D Integrated Circuit Packagings

Authors: Ching-Feng Chen, Ching-Chih Tsai

Abstract:

With the size of the transistor gradually approaching the physical limit, it challenges the persistence of Moore’s Law due to such issues of the short channel effect and the development of the high numerical aperture (NA) lithography equipment. In the context of the ever-increasing technical requirements of portable devices and high-performance computing (HPC), relying on the law continuation to enhance the chip density will no longer support the prospects of the electronics industry. Weighing the chip’s power consumption-performance-area-cost-cycle time to market (PPACC) is an updated benchmark to drive the evolution of the advanced wafer nanometer (nm). The advent of two and half- and three-dimensional (2.5 and 3D)- Very-Large-Scale Integration (VLSI) packaging based on Through Silicon Via (TSV) technology has updated the traditional die assembly methods and provided the solution. This overview investigates the up-to-date and cutting-edge packaging technologies for 2.5D and 3D integrated circuits (IC) based on the updated transistor structure and technology nodes. We conclude that multi-chip solutions for 2.5D and 3D IC packaging can prolong Moore’s Law.

Keywords: Moore’s Law, High Numerical Aperture, Power Consumption-Performance-Area-Cost-Cycle Time to Market, PPACC, 2.5 and 3D-Very-Large-Scale Integration Packaging, Through Silicon Vi.

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1 A Highly Efficient Process Applying Sige Film to Generate Quasi-Beehive Si Nanostructure for the Growth of Platinum Nanopillars with High Emission Property for the Applications of X-Ray Tube

Authors: Pin-Hsu Kao, Wen-Shou Tseng, Hung-Ming Tai, Yuan-Ming Chang, Jenh-Yih Juang

Abstract:

We report a lithography-free approach to fabricate the biomimetics, quasi-beehive Si nanostructures (QBSNs), on Si-substrates. The self-assembled SiGe nanoislands via the strain induced surface roughening (Asaro-Tiller-Grinfeld instability) during in-situ annealing play a key role as patterned sacrifice regions for subsequent reactive ion etching (RIE) process performed for fabricating quasi-beehive nanostructures on Si-substrates. As the measurements of field emission, the bare QBSNs show poor field emission performance, resulted from the existence of the native oxide layer which forms an insurmountable barrier for electron emission. In order to dramatically improve the field emission characteristics, the platinum nanopillars (Pt-NPs) were deposited on QBSNs to form Pt-NPs/QBSNs heterostructures. The turn-on field of Pt-NPs/QBSNs is as low as 2.29 V/μm (corresponding current density of 1 μA/cm2), and the field enhancement factor (β-value) is significantly increased to 6067. More importantly, the uniform and continuous electrons excite light emission, due to the surrounding filed emitters from Pt-NPs/QBSNs, can be easily obtained. This approach does not require an expensive photolithographic process and possesses great potential for applications.

Keywords: Biomimetics, quasi-beehive Si, SiGe nanoislands, platinum nanopillars, field emission.

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