Vertical Micromirror Fabrication by X-ray Lithography for Single Mode Optical Fiber Switching Applications

Authors: R. Chimchang, R. Tongta, R. Phatthanakun

Abstract:

Inthis paper, design and fabrication of vertical micromirror for optical switching applications of single mode optical fibers are proposed. The structure of micromirror will be created from negative photoresist (SU-8) on X-ray lithography using X-ray from synchrotron light source. The properties of X-ray from synchrotron light source are high-energy electrons which can construct materials that have a high aspect ratio. In addition, the technique of gold coating of reflective material has been used for change direction of light between two pairs of optical fibers. At a wavelength of 1310 nm with minimum average loss of 5.305 dB is obtained.

Keywords: vertical micromirror, negative photoresist, X-ray lithography

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1329911

References:

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