TY - JFULL AU - A. A. Abaker Omer and H. B. Mohamed Balh and W. Liu and A. Abas and J. Yu and S. Li and W. Ma and W. El Kolaly and Y. Y. Ahmed Abuker PY - 2020/2/ TI - Nano-Texturing of Single Crystalline Silicon via Cu-Catalyzed Chemical Etching T2 - International Journal of Energy and Environmental Engineering SP - 48 EP - 54 VL - 14 SN - 1307-6892 UR - https://publications.waset.org/pdf/10011029 PU - World Academy of Science, Engineering and Technology NX - Open Science Index 157, 2020 N2 - We have discovered an important technical solution that could make new approaches in the processing of wet silicon etching, especially in the production of photovoltaic cells. During its inferior light-trapping and structural properties, the inverted pyramid structure outperforms the conventional pyramid textures and black silicone. The traditional pyramid textures and black silicon can only be accomplished with more advanced lithography, laser processing, etc. Importantly, our data demonstrate the feasibility of an inverted pyramidal structure of silicon via one-step Cu-catalyzed chemical etching (CCCE) in Cu (NO3)2/HF/H2O2/H2O solutions. The effects of etching time and reaction temperature on surface geometry and light trapping were systematically investigated. The conclusion shows that the inverted pyramid structure has ultra-low reflectivity of ~4.2% in the wavelength of 300~1000 nm; introduce of Cu particles can significantly accelerate the dissolution of the silicon wafer. The etching and the inverted pyramid structure formation mechanism are discussed. Inverted pyramid structure with outstanding anti-reflectivity includes useful applications throughout the manufacture of semi-conductive industry-compatible solar cells, and can have significant impacts on industry colleagues and populations. ER -