Temperature-Dependent Barrier Characteristics of Inhomogeneous Pd/n-GaN Schottky Barrier Diodes Surface
Commenced in January 2007
Frequency: Monthly
Edition: International
Paper Count: 32799
Temperature-Dependent Barrier Characteristics of Inhomogeneous Pd/n-GaN Schottky Barrier Diodes Surface

Authors: K. Al-Heuseen, M. R. Hashim

Abstract:

The current-voltage (I-V) characteristics of Pd/n-GaN Schottky barrier were studied at temperatures over room temperature (300-470K). The values of ideality factor (n), zero-bias barrier height (φB0), flat barrier height (φBF) and series resistance (Rs) obtained from I-V-T measurements were found to be strongly temperature dependent while (φBo) increase, (n), (φBF) and (Rs) decrease with increasing temperature. The apparent Richardson constant was found to be 2.1x10-9 Acm-2K-2 and mean barrier height of 0.19 eV. After barrier height inhomogeneities correction, by assuming a Gaussian distribution (GD) of the barrier heights, the Richardson constant and the mean barrier height were obtained as 23 Acm-2K-2 and 1.78eV, respectively. The corrected Richardson constant was very closer to theoretical value of 26 Acm-2K-2. 

Keywords: Electrical properties, Gaussian distribution, Pd-GaN Schottky diodes, thermionic emission.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1109281

Procedia APA BibTeX Chicago EndNote Harvard JSON MLA RIS XML ISO 690 PDF Downloads 2132

References:


[1] H. Morkoc, S. Strite, G.B. Gao, M.E. Lin, B. Sverdlov, M. Burns, J. Appl. Phys.,vol. 76,pp. 1363,1994.
[2] J. D. Guo, M. S. Feng, R. J. Guo, F. M. Pan, C. Y. Chang, Appl. Phys. Lett. Vol. 67,pp 2657, 1995.
[3] L. Wang, M. Y. Nathan, T. H. Lim, M. A. Khan, Q. Chen, Appl. Phys. Lett. Vol. 68, pp 1267, 1996.
[4] K. Suzue, S. N. Mohammad, Z. F. Fan, W. Kim, O. Aktas, A. E. Botchkarev, H. Morkoc, J. Appl. Phys. Vol. 80, pp. 4467, 1996.
[5] Q. Z. Liu, L. S. Yu, S. S. Lau, J. M. Redwing, N. R. Perkins, T. F. Kuoch, Appl. Phys. Lett.. vol 70, pp. 1275, 1997.
[6] S. C. Binari, K. Doverspike, G. Kelner, H. B. Dietrich, A. E. Wickenden, Solid-State Electron. Vol. 41, pp. 177, 1997.
[7] C.K. Tan, A. Abdul Aziz, F.K. Yam, Applied Surface Science. Vol. 252, pp. 5930, 2006.
[8] B. Deba, A. Ganguly, S. Chaudhuri, B.R. Chakraborti, A.K. Pal. Materials Chemistry and Physics. Vol. 74, pp. 282, 2002.
[9] V. Rajagopal Reddy. Materials Chemistry and Physics. Vol. 93, pp. 286, 2005.
[10] B. Akkal, Z. Benamara, H. Abid, A. Talbi, B. Gruzza, Materials Chemistry and Physics. Vol. 85, pp. 27 2004.
[11] J. Osvald, J. Kuzmik, G. Konstantinidis, P. Lobotka, A. Georgakilas, Microelectronic Engineering. Vol. 81, pp. 181, 2005.
[12] A. R. Arehart, B. Moran, J. S. Speck, U. K. Mishra, S. P. Den Baars, S .A. Ringel, J. Appl. Phys. Vol. 100, pp. 023709, 2006.
[13] Z. Tekeli, Ş. Altındal, M. Çakmak, S. Özçelik, J. Appl. Phys. Vol. 102, pp. 054510, 2007.
[14] M. Ravinandan, P. Koteswara Rao, V. Rajagopal Reddy, Semicond. Sci. Technol. Vol.24, pp. 035004, 2009.
[15] E. H. Rhoderick, R. H. Williams, Metal Semiconductor Contacts second ed., (Oxford: Oxford University Press) (1988).
[16] V. L. Rideout, Solid-State Electron. Vol. 18, pp. 541, 1975.
[17] P. Koteswara Rao, V. Rajagopal Reddy. Materials Chemistry and Physics. Vol. 114, pp. 821, 2009.
[18] Yu-Zung Chiou , Jung-Ran Chiou , Yan-Kuin Su, Shoou-Jinn Chang,Bohr-Ran Huang, Chia-Sheng Chang, Yi-Chao Lin Materials Chemistry and Physics. Vol. 80, pp. 201, 2003.
[19] Y. Kribes, I. Harrison, B. Tuck, T.S. Cheng, C.T. Foxon, Semicond. S ci. Technol. vol. 12, pp. 913, 997.
[20] L.F. Wanger, R.W. Young, A. Sugerman, IEEE Electron Dev. Lett.vol. 4, pp. 320, 983.
[21] J.D. Guo, F.M. Pan, M.S. Feng, R.J. Guo, R.F. Chou, C.Y. Chang, J. Appl. Phys. Vol.80, pp. 1623, 1996.
[22] F. Lucolano, F. Roccaforte, F. Giannazzo, V. Raineri, J. Appl. Phys. Vo.102, pp. 113, 2007.
[23] F. Roccaforte, F. La Via, V. Raineri, R. Pierobon, E. Zanoni, J. Appl. Phys. Vol. 93, pp. 9137, 2003.
[24] J S. Altindal, S. Karadeniz, N. Tougˇluogˇlu, A. Tataroglu, Solid-State Electron. Vol. 47, pp. 1847, 2003.
[25] J. H. Werner, H.H. Guttler, J. Appl. Phys. Vol. 69, pp. 1522, 1991.
[26] Y.P.Song, R.L.Meirhaeghe, W.H.Laflere, F.Cardon, Solid State Electron. Vol. 29, pp. 663, 1986.
[27] I. Dokme, S. Altindal, M.M. Bulbul, Appl. Surf. Sci. vol.252, pp. 7749, 2006.
[28] S. Zeyrek, S. Altındal, H. Yüzer, M. M. Bülbül, Appl. Surf. Sci. vol. 252, pp. 2999, 2006.
[29] S. Zhu, R. L. VanMeirhaege, C. Detavernier, F. Cardon, G. P. Ru, X. P. Qu, B. Z. Li, Solid State Electron. Vol. 44, pp. 663, 2000.
[30] M. K. Hudait, S. P. Venkateswarlu, S. B. Krupanidhi, Solid State Electron. Vol. 45, pp. 133, 2001.