Bode Stability Analysis for Single Wall Carbon Nanotube Interconnects Used in 3D-VLSI Circuits
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Bode Stability Analysis for Single Wall Carbon Nanotube Interconnects Used in 3D-VLSI Circuits

Authors: Saeed H. Nasiri, Rahim Faez, Bita Davoodi, Maryam Farrokhi

Abstract:

Bode stability analysis based on transmission line modeling (TLM) for single wall carbon nanotube (SWCNT) interconnects used in 3D-VLSI circuits is investigated for the first time. In this analysis, the dependence of the degree of relative stability for SWCNT interconnects on the geometry of each tube has been acquired. It is shown that, increasing the length and diameter of each tube, SWCNT interconnects become more stable.

Keywords: Bode stability criterion, Interconnects, Interlayer via, Single wall carbon nanotubes, Transmission line method, Time domain analysis

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1070771

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References:


[1] A. Nieuwoudt, and Y. Massoud, "Understanding the Impact of Inductance in Carbon Nanotube Bundles for VLSI Interconnect Using Scalable Modeling Techniques," IEEE Transactions on Nanotechnology, vol. 5, pp 758-765 , Nov. 2006.
[2] International Technology Roadmap for Semiconductors (ITRS), 2009. http://www.itrs.net
[3] B. Q. Wei, R. Vajtai, and P. M. Ajayan, "Reliability and current carrying capacity of carbon nanotubes," Applied physics letters, vol. 79, pp 1172- 1174 , july 2001.
[4] Kaustav Banerjee, Sungjun Im, and Navin Srivastava, "Interconnect Modeling and Analysis in the Nanometer Era: Cu and Beyond," Proceedings of the 22nd Advanced Metallization Conference, Colorado Springs,Sep. 2005.
[5] A.G. Chiariello, A. Maffucci, and G. Miano, "Signal Integrity Analysis of Carbon Nanotube on-chip Interconnects," IEEE Signal Propagation on Interconnects, Strasbourg, pp. 1-4, June 2009.
[6] N. Srivastava and K. Banerjee, "Performance analysis of carbon nanotube interconnects for VLSI applications," in IEEE ICCAD, pp. 383-390, Nov. 2005.
[7] W. H. Hayt, and J. A. Buck, "Engineering Electromagnetics," 7th Ed. New York: McGraw-Hill, 2005.
[8] A. Naeemi and J. D. Meindl, "Compact physical models for multiwall carbon-nanotube interconnects,"" IEEE Electron Device Lett., vol. 27,no. 5, pp. 338-340, May 2006.
[9] R. C. Dorf, R. H. Bishop, Modern Control System, 11th Ed., Englewood Cliffs, NJ: Prentice-Halls, 2008.
[10] D. Fathi, and B. Forouzandeh, "A Novel Approach for Stability Analysis in Carbon Nanotube Interconnects," IEEE Electron Device Lett., vol. 30, pp. 475-477, Apr. 2009.
[11] D. Fathi, B. Forouzandeh, S. Mohajerzadeh, and R. Sarvari, "Accurate analysis of carbon nanotube interconnects using transmission line model," Micro & Nano letters, vol. 4, pp. 116-121, Jul. 2009.
[12] S. H. Nasiri, M. K. Moravvej-Farshi, and R. Faez, "Stability Analysis in Graphene Nanoribbon Interconnects," IEEE Electron Device Lett., vol. 31, pp. 1458-1460, Oct. 2010.