Characterization of Microroughness Parameters in Cu and Cu2O Nanoparticles Embedded in Carbon Film

Authors: S.Solaymani, T.Ghodselahi, N.B.Nezafat, H.Zahrabi, A.Gelali

Abstract:

The morphological parameter of a thin film surface can be characterized by power spectral density (PSD) functions which provides a better description to the topography than the RMS roughness and imparts several useful information of the surface including fractal and superstructure contributions. Through the present study Nanoparticle copper/carbon composite films were prepared by co-deposition of RF-Sputtering and RF-PECVD method from acetylene gas and copper target. Surface morphology of thin films is characterized by using atomic force microscopy (AFM). The Carbon content of our films was obtained by Rutherford Back Scattering (RBS) and it varied from .4% to 78%. The power values of power spectral density (PSD) for the AFM data were determined by the fast Fourier transform (FFT) algorithms. We investigate the effect of carbon on the roughness of thin films surface. Using such information, roughness contributions of the surface have been successfully extracted.

Keywords: Atomic force microscopy, Fast Fourier transform, Power spectral density, RBS.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1327439

References:

[1] T. Jiang, N. Hall, A. Ho, S. Morin, Thin Solid Films 471 (2005) 76- 85.
[2] A.A. Gewirth, B.K. Niece, Chem. Rev. 97 (1997) 1129.
[3] D.M. Kolb, Electrochim. Acta 45 (2000) 2387..
[4] O.M. Magnussen, F.A. Moller, A. Lachenwitzer, R.J. Behm, Electrochemical Synthesis and Modification of Materials, Materials Research Society Symposium Proceedings, vol. 451, 1997, p. 43.
[5] G. Binnig, C.F. Quate, C. Gerber, Phys. Rev. Lett. 56 (1986) 930.
[6] J.M. Bennett, L. Mattson, Introduction to Surface Roughness and Scattering, Optical Society of America, Washington, DC, 1989.
[7] W. Kwa'sny, L.A. Dobrza'nski, M. Pawlyta, W. Gulbi'nski, J. Mater. Process. Technol. 157-158 (2004) 188-193.
[8] Taketsugu Itoh, Noriyoshi Yamauchi, Applied Surface Science 253 (2007) 6196-6202.
[9] S. Jakobs, A. Duparre, H. Truckenbrodt, Interfacial roughness and related scatter in ultraviolet optical coatings: a systematic experimental approach, Appl. Opt. 37 (7) (1998) 1180-1193.
[10] J.F. Borrull, A. Duparre, E. Quesnel, Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings, Appl. Opt. 40 (13) (2001) 2190-2199.
[11] J.P. Singh, R. Singh, N.C. Mishra, D. Kanjilal, V. Ganesan, Temperaturedependent roughness of electronically excited InP surfaces, J. Appl. Phys. 90 (12) (2001) 5968-5972
[12] T. Ghodselahi, M.A. Vesaghi, A. Shafiekhani, A. Baradaran, A. Karimi, Z. Mobini, Co-deposition process of RF-Sputtering and RF-PECVD of copper/carbon nanocomposite films, Surface & Coatings Technology 202 (2008) 2731-2736.