Anti-Reflective Nanostructured TiO2/SiO2 Multilayer Coatings

Authors: Najme lari, Shahrokh Ahangarani, Ali Shanaghi

Abstract:

Multilayer structure of thin films by the sol–gel process attracts great attention for antireflection applications. In this paper, antireflective nanometric multilayer SiO2-TiO2 films are formed on both sides of the glass substrates by combining the sol–gel method and the dip-coating technique. SiO2 and TiO2 sols were prepared using tetraethylorthosilicate (TEOS) and tetrabutylorthotitanate (TBOT) as precursors and also nitric acid as catalyst. Prepared coatings were investigated by Field-emission scanning electron microscope (FE-SEM), Fourier-transformed infrared spectrophotometer (FT-IR) and UV–visible spectrophotometer. After evaluation, all of SiO2 top layer coatings showed excellent antireflection in the wavelength range of 400-800 nm where the transmittance of glass substrate is significantly lower. By increasing the number of double TiO2-SiO2 layers, the transmission of the coated glass increases due to applied multilayer coating properties. 6-layer sol–gel TiO2-SiO2 shows the highest visible transmittance about 99.25% at the band of 550-650 nm.

Keywords: thin films, optical properties, sol-gel, multilayer