The Effects of Applied Negative Bias Voltage on Structure and Optical Properties of α-C:H Films
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The Effects of Applied Negative Bias Voltage on Structure and Optical Properties of α-C:H Films

Authors: X. L. Zhou, S. Tunmee, I. Toda, K. Komatsu, S. Ohshio, H. Saitoh

Abstract:

Hydrogenated amorphous carbon (a-C:H) films have been synthesized by a radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) technique with different bias voltage from 0.0 to -0.5 kV. The Raman spectra displayed the polymer-like hydrogenated amorphous carbon (PLCH) film with 0.0 to -0.1 and a-C:H films with -0.2 to -0.5 kV of bias voltages. The surface chemical information of all films were studied by X-ray photoelectron spectroscopy (XPS) technique, presented to C-C (sp2 and sp3) and C-O bonds, and relative carbon (C) and oxygen (O) atomics contents. The O contamination had affected on structure and optical properties. The true density of PLCH and a-C:H films were characterized by X-ray refractivity (XRR) method, showed the result as in the range of 1.16-1.73 g/cm3 that depending on an increasing of bias voltage. The hardness was proportional to the true density of films. In addition, the optical properties i.e. refractive index (n) and extinction coefficient (k) of these films were determined by a spectroscopic ellipsometry (SE) method that give formation to in 1.62-2.10 (n) and 0.04-0.15 (k) respectively. These results indicated that the optical properties confirmed the Raman results as presenting the structure changed with applied bias voltage increased.

Keywords: Negative bias voltage, a-C:H film, Oxygen contamination, Optical properties.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1097168

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References:


[1] S. Kassavetis, A. Laskarakis, S. Logothetidis, “Effect of ion bombardment and hydrogen pressure during deposition on the optical properties of hydrogenated amorphous carbon thin films,” Diamond Relat. Mater., vol. 20, pp. 109-114, November 2010.
[2] H. Tsai, D.B. Bogy, “Characterization of diamond like carbon films and their application as overcoats on thin-film media for magenetic recording,” J. Vac. Sci. Tech., vol. A 5, no.6, pp. 3287, July 1987.
[3] P.C. Tsai, K.H. Chen, “Evaluation of microstructures and mechanical properties of diamond like carbon films deposited by filtered cathodic arc plasma,” Thin Solid Films, vol. 516, pp. 5440-5444, July 2008.
[4] G. Fedosenko, D. Korzec, J. Engemann, D. Lyebyedyev, H.C. Scheer, “Investigation of diamond-like carbon films synthesized by multi-jeet hollow cathode rf plasma source,” Thin Solid Films, vol. 406, pp. 275-281, December 2001.
[5] K. Bewilogua, D. Hofmann, “History of diamond-like carbon films―From first experiments to worldwide applications,” Surf. Coatings. Technol., vol. 242, pp. 214-225, January 2014.
[6] Y. Lifshitz, “Diamond-like carbon―present status,” Diamond Relat. Mater., vol. 8, pp. 1659-1676, December 1998.
[7] H. Saitoh, “Classification of Diamond-Like Carbon Films,” Jpn. J. Appl. Phys., vol 51, pp. 090120, August 2012.
[8] B.C. Na, A. Tanaka, “Tribological characteristics of diamond-like films based on hardness of mating materials,” Thin Solid Films, vol. 478, pp. 176-182, December 2005.
[9] J. Robertson, “Diamond-like a morphous carbon,” Mater. Sci. Eng., vol. R37, pp .129-281, May 2002.
[10] H.X. Li, T. Xu, J.M. Chen, H.D. Zhou, H.W. Liu, “The effect of applied dc bias voltage on the properties of a-C:H films prepared in a dual dc-rf plasma system,” Appl. Surf. Sci., vol. 227, pp. 364-372, December 2004.
[11] M. Smietana, W.J. Bock, J. Szmidt, J. Grabarczyk, “Substrate effect on the optical properties and thickness of diamond-like carbon films deposited by the RF PACVD method,” Diamond Relat. Mater., vol. 19, pp. 1461-1465, August 2010.
[12] M. Smietana, M.L. Korwin-Pawlowski, W.J. Bock, G.R. Pickrell, J. Szmidt, “Refractive index sensing of fiber optic long-period grating structures coated with a plasma deposited diamond-like carbon thin film,” Meas. Sci. Technol., vol. 19, pp.085301, June 2008.
[13] N. Kato, H. Mori, N. Takahashi, “Spectroscopic ellipsometry of silicon-containing diamond-like carbon (DLC-Si) films,” Phys. Stat. sol. (c), vol. 5 No.5, pp 1117-1120, February 2008.
[14] M. Lattemann, B. Abendroth, A. Moafi, D. G. McCulloch, D.R. McKenzie, “Controlled glow to arc transition in sputtering for high rate deposition of carbon films,” Diamond Relat. Mater., vol. 20, pp. 68-74, February 2011.
[15] N. Fourches, G. Turban, B. Grooleau, “Study of DLC/silicon interfaces by XPS and in-situ ellipsometry,” Appl. Surf. Sci., vol. 68, pp. 149-160, May 1993.
[16] D.P. Dowling, K. Donnelly, M. Monclus, M. McGuinnes, “The use of refractive index as a measure of diamond-lik carbon film quality,” Diamond Relat. Mater., vol. 7, pp 432-434, August 1997.
[17] M. Stenberg, T. SandstrÖm. L. Stiblert, “A new ellipsometric method for measurements on surface and surface layers,” Mater. Sci. Eng., vol. 42, pp. 65-69, February 1980.
[18] C. Casiraghi, A.C. Ferrari, J. Robertson, “Raman spectroscopy of hydrogenated amorphous carbons,” Phys. Rev. B, vol. 72, pp. 085401, August 2005.
[19] K. Kamata, T. Inoue, K. Sugai, H. Saitoh, K. Maruyama, “Effect of negative dc bias voltage on mechanical property of a-C:H films deposited in electron cyclotron resonance plasma,” J. Appl. Phys., vol. 78 no.2, pp. 1394-1396, July 1995.
[20] F.X. Liu, Z.L. Wang, “Thickness dependence of the structure of diamond-like carbon films by Raman spectroscopy,” Surf. Coatings. Technol., vol. 203, pp. 1829-1832, January 2009.
[21] S. Chowdhury, M.T. Laugier, I.Z. Rahman, “effect of target self-bias on the mechnical properties of diamond-like carbon films deposited by RF magnetron sputtering,” Thin Solid Films, vol. 468, pp. 179-154, June 2004.
[22] L. Sun, H.K. Li, G.Q. Lin, C. Dong, “influence of deposition parameters on the microstructure and properties of nitrogen-doped diamond-like carbon films,” J. Vac. Sci. Technol. A, vol. 28, No.6, pp. 1299-1306, November 2010.
[23] M. Oku, S. Suzuki, N. Ohtsu, T. Shishido, K. Wagatsuma, “Comparision of intrinsic zero-energy loss and Shirley-type background corrected profiles of XPS spectra for quantitative surface analysis: Study of Cr, Mn and Fe oxides,” Appl. Surf. Sci., vol. 254, pp. 5141-5148, February 2008.
[24] J. Filik, P.W. May, S.R.J. Pearce, P.K. Wild, K.R. Hallam, “XPS and laser Raman analysis of hydrogenated amorphous carbon films,” Diamond Relat. Mater., vol. 12, pp. 974-978, March-July 2003.
[25] J.H. Sui, W. Cai, “Effect of bias voltage on the structure and electrochemical corrosion behavior of hydrogenated amorphous carbon (a-C:H) films on NiTi alloys,” Surf. Coatings. Technol., vol 201, pp. 6906-6909, October 2006.
[26] J.C. Damasceno, S.S. Camargo. Jr., “Plasma deposition and characterization of silicon oxide-containing diamond-like carbon films obtained from CH4:SiH4:O2 gas mixtures,” Thin Solid Films, vol. 516, pp. 1890-1897, January 2008.
[27] M. Clin, O. Durand-Drouhin, A. Zeinert, J.C. Picot, “A correlation between the microstructure and optical properties of hydrogenated amorphous carbon films prepared by RF mangnetron sputtering,” Diamond Relat. Mater., vol 8, pp. 527-531, October 1998.
[28] W.G. Cui, Q.B. Lai, L. Zhang, F.M. Wang, “Quantitative measurements of sp3 content in DLC films with Raman spectroscopy,” Surf. Coatings. Technol., vol. 205, pp. 1995-1999, August 2010.
[29] M. Hiratsuka, H. Nakamori, Y. Kogo, M. Sakurai, N. Ohtake, H. Saitoh, “Correlation between Optical Properties and Hardness of Diamond-Like Carbon Films,” JSME, vol. 7 no. 2, pp. 187-198, September 2013.
[30] C. Corbella, M.C. Polo, G. Oncins, E. Pascual, J.L. Andújar, E. Bertran, “Time-resolved electrical measurements of a pulsed-dc methane dischange used in diamond-like carbon films production,” Thin Solid Films, vol. 482, pp. 172-176, January 2005.