Commenced in January 2007
Frequency: Monthly
Edition: International
Paper Count: 30172
The Role of Ga to Improve AlN-Nucleation Layer for Al0.1Ga0.9N/Si(111)

Authors: AlNPhannee Saengkaew, Armin Dadgar, Juergen Blaesing, Thomas Hempel, Sakuntam Sanorpim, Chanchana Thanachayanont, Visittapong Yordsri, Watcharee Rattanasakulthong, Alois Krost

Abstract:

Group-III nitride material as particularly AlxGa1-xN is one of promising optoelectronic materials to require for shortwavelength devices. To achieve the high-quality AlxGa1-xN films for a high performance of such devices, AlN-nucleation layers are the important factor. To improve the AlN-nucleation layers with a variation of Ga-addition, XRD measurements were conducted to analyze the crystalline quality of the subsequent Al0.1Ga0.9N with the minimum ω-FWHMs of (0002) and (10-10) reflections of 425 arcsec and 750 arcsec, respectively. SEM and AFM measurements were performed to observe the surface morphology and TEM measurements to identify the microstructures and orientations. Results showed that the optimized Ga-atoms in the Al(Ga)Nnucleation layers improved the surface diffusion to form moreuniform crystallites in structure and size, better alignment of each crystallite, and better homogeneity of island distribution. This, hence, improves the orientation of epilayers on the Si-surface and finally improves the crystalline quality and reduces the residual strain of subsequent Al0.1Ga0.9N layers.

Keywords: AlGaN, UV-LEDs, seed layers, AFM, TEM

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1328736

Procedia APA BibTeX Chicago EndNote Harvard JSON MLA RIS XML ISO 690 PDF Downloads 1183

References:


[1] S. Hwang, M. Islam, B. Zhang, M. Lachab, J. Dion, A. Heidari, H. Nazir,V. Adivarahan, and A. Khan: Appl. Phys. Express 4 (2011) 012102.
[2] V. Adivarahan, A. Heidari, B. Zhang, Q. Fareed, S. Hwang, M. Islam, and A. Khan: Appl. Phys. Express 2 (2009) 102101.
[3] W. H. Sun, J. Zhang, J. Yang, H. P. Maruska, A. Khan, R. Liu, and F. A. Ponce: Appl. Phys. Lett. 87 (2005) 211915.
[4] P. Saengkaew, A. Dadgar, J..Blaesing, T. Hempel, P. Veit, J. Christen and A. Krost: J. Cryst. Growth 311 (2009) 3742.
[5] S. Boeykens, M. R. Leys, M. Germain, K. Cheng, J. Derluyn, B. Van Daele, G. Van Tendeloo, R. Belmans, G. Borghs: Phys. Status Solidi C 3 (2006) 1579.
[6] C. H. Wei, J. H. Edgar, C. Ignatiev and J. Chaudhuri: Thin Solid Films 360 (2000) 34.
[7] J. Cao, S. Li, G. Fan, Y. Zhang, S. Zheng, Y. Yin, J. Huang and J. Su, J. Cryst. Growth 312 (2010) 2044.
[8] M. A. Khan, M. Shatalov, H. P. Maruska, H. M. Wang and E. Kuokstis: Jpn. J. Appl. Phys. 44 (2005) 7191.