Effects of Mo Thickness on the Properties of AZO/Mo/AZO Multilayer Thin Films
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Effects of Mo Thickness on the Properties of AZO/Mo/AZO Multilayer Thin Films

Authors: Hung-Wei Wu, Chien-Hsun Chu, Ru-Yuan Yang, Chin-Min Hsiung

Abstract:

In this paper, we proposed the effects of Mo thickness on the properties of AZO/Mo/AZO multilayer thin films for opto-electronics applications. The structural, optical and electrical properties of AZO/Mo/AZO thin films were investigated. Optimization of the thin films coatings resulted with low resistivity of 9.98 × 10-5 )-cm, mobility of 12.75 cm2/V-s, carrier concentration of 1.05 × 1022 cm-3, maximum transmittance of 79.13% over visible spectrum of 380 – 780 nm and Haacke figure of merit (FOM) are 5.95 × 10-2 )-1 under Mo layer thickness of 15 nm. These results indicate an alternative candidate for use as a transparent electrode in solar cells and various displays applications.

Keywords: Aluminum-doped zinc oxide, AZO, multilayer, RF magnetron sputtering, AZO/Mo/AZO, thin film, transparent conductive oxides.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1055008

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[1] G. Golan, A. Axelevitch, B. Gorenstein and A. Peled, "Novel type of indium oxide thin films sputtering for opto-electronic applications," Applied Surface Science, vol.253, pp.6608-6611, 2007.
[2] Betz U, Kharrazi, Olsson M, Marthy J, Escola M F and Atamny F, " Thin films engineering of indium tin oxide: Large area flat panel displays application," Surf. Coat. Technol. , Vol. 200, pp. 5751-5759, 2006.
[3] D. Arai, M. Kondo, A. Matsuda, "Reduction of light-induced defects by nano-structure tailored silicon solar cells using low-cost TCO substrates," Sol. Energ. Mater. Sol. Cell, vol. 90, pp. 3174-3178, 2006.
[4] T. Hino,Y. Ogawa and N. Kuramoto, "Preparation of functionalized and non-functionalized fullerene thin films on ITO glasses and the application to a counter electrode in a dye-sensitized," Carbon , vol. 44, pp. 880-887, 2006.
[5] Jin-A Jeong,Yong-Seok Park and Han-Ki Kim, "Comparison of electrical, optical, structural, and interface properties of IZO/Ag/IZO and IZO/Au/IZO multilayer electrodes for organic photovoltaics", J. Appl. Phys. vol. 107, pp. 0233111, 2010.
[6] D.R. Sahu , Shin-Yuan Lin and Jow-Lay Huang, "Investigation of conductive and transparent Al-doped ZnO/Ag/Al-doped ZnO multilayer coatings by electron beam evaporation," Thin Solid Films, vol. 516, pp. 4728-4732, 2008.
[7] Y.S. Jung, Y.W. Choi, H.C. Lee, D.W. Lee, "Effects of thermal treatment on the electrical and optical properties of silver-based indium tin oxide/metal/indium tin oxide structures," Thin Solid Films, vol. 440, pp. 278-284, 2003.
[8] Y. Aoshima, M. Miyazaki, K. Sato, Y. Akao, S. Takaki, K. Adachi, "Development of silver-based multilayer coating electrodes with low resistance for use in flat panel displayers," Jpn. J. Appl. Phys. Vol. 39, pp. 4884-4889, 2000.
[9] E. Ando and M. Miyazaki, "Moisture resistance of the low-emissivity coatings with a layer structure of Al-doped ZnO/Ag/Al-doped ZnO," Thin Solid Films, vol. 392, pp. 289, 2001.
[10] D. R. Sahu and J. L. Huang, "Characteristics of ZnO/Cu/ZnO multilayer films on copper layer properties," Applied Surface Science, vol. 253, pp. 827-832, 2006.
[11] X. Liu, X. Cai, J. Mao, C. Jin, "ZnS/Ag/ZnS nano-multilayer films for transparent electrodes in flat display application," Appl. Surf. Sci., vol. 183, pp. 103, 2001.
[12] Jin-A Jeong, Han-Ki Kim., "Low resistance and highly transparent ITO/Ag/ITO multilayer electrode using surface plasmon resonance of Ag layer for bulk-heterojunction organic solar cells," Solar Energy Materials & Solar Cells, vol. 93, pp. 1801-1809, 2009.
[13] S. Sutthana, N. Hongsith, S. Choopun, "AZO/Ag/AZO multilayer films prepared by DC magnetron sputtering for dye-sensitized solar cell application," Current Applied Physics, vol. 10, pp. 813-816, 2010.
[14] Y.P. Wang, J.G. Lu, X. Bie, Z.Z. Ye, X. Li, D. Song, X.Y. Zhao, W.Y. Ye, "Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature," Applied Surface Science, vol. 257, pp. 5966-5971, 2011.
[15] M. Fahland, P. Karlsson, C. Charton, "Low resistivity transparent electrodes for display on polymer substrates," Thin Solid Films, vol. 392, pp.334-337, 2001.
[16] G. Gordillo, F. Mesa, and C. Calderon, "Electrical and Morphological Properties of Low Resistivity Mo thin Films Prepared by Magnetron Sputtering," Brazilian Journal of Physics, vol. 36, pp. 982, 2006.
[17] X.T. Hao, L.W. Tan, K.S. Ong and F. Zhu, "High-performance low-temperature transparent conducting aluminum doped ZnO thin films and applications," Journal of Crystal Growth, vol. 287, pp. 44, 2006.
[18] B.D. Cullity, "Elements of X-ray Diffraction, " 2nd ed, Addison-Wesley, New York, chap.3, pp. 102, 1978.
[19] Hung-Wei Wu, Ru-Yuan Yang, Chin-Min Hsiung, Chien-Hsun Chu, "Effects of Ar Flow on the Optoelectronic Characteristics of Aluminum-doped Zinc Oxide (AZO) Thin Films Prepared by RF Magnetron Sputtering," International Symposium on Computer Consumer and Control," pp. 309-312, 2012.
[20]
[20] M. Suchea, S Christoulakis, N. Katsarakis, T. Kitsopoulos and G. Kiriakidis, "Comparative study of ZnO and Al-doped ZnO transparent thin films grown by DC magnetron sputtering", Thin Solid Films, vol. 515, pp. 6562-6566, 2007.
[21] M. Bender, W. Seelig, C. Daube, H. Frankenberger, B. Ocker, and J. Stollenwerk, "Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films," Thin Solid Films, vol. 326, pp. 72-77, 1998.
[22] Z.L. Pei, C. Sun, M.H. Tan, J.Q. Xiao, D.H. Guan, R.F. Huang, L.S. Wen, "Optical and electrical properties of direct-current magnetron sputtered ZnO:Al films," J. Appl. Phys. Vol. 90, pp. 3432, 2001.
[23] A. Indluru, T.L. Alford, "Effect of Ag thickness on electrical transport and optical properties of indium tin oxide/Ag/indium tin oxide multilayers", J. Appl. Phys. vol.105, pp. 123528, 2009.
[24] Park K C, Ma D Y and Kim K H., "The physical properties of Al doped zinc oxide films prepared by RF magnetron sputtering," Thin Solid Films. vol. 305, pp. 201-209, 1997.
[25] K. Sivaramakrishnan, N. D. Theodore, J. F. Moulder and T. L. Alford, "The role of copper in ZnO/Cu/ZnO thin films for flexible electronics," J. Appl. Phys. vol. 106, pp. 063510, 2009.
[26] G. Haacke, "New figure of merit for transparent conductors", J. Appl. Phys. vol. 47, pp. 4086-4089, 1976.