A Novel 14 nm Extended Body FinFET for Reduced Corner Effect, Self-Heating Effect, and Increased Drain Current
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A Novel 14 nm Extended Body FinFET for Reduced Corner Effect, Self-Heating Effect, and Increased Drain Current

Authors: Cheng-Hsien Chang, Jyi-Tsong Lin, Po-Hsieh Lin, Hung-Pei Hsu, Chan-Hsiang Chang, Ming-Tsung Shih, Shih-Chuan Tseng, Min-Yan Lin

Abstract:

In this paper, we have proposed a novel FinFET with extended body under the poly gate, which is called EB-FinFET, and its characteristic is demonstrated by using three-dimensional (3-D) numerical simulation. We have analyzed and compared it with conventional FinFET. The extended body height dependence on the drain induced barrier lowering (DIBL) and subthreshold swing (S.S) have been also investigated. According to the 3-D numerical simulation, the proposed structure has a firm structure, an acceptable short channel effect (SCE), a reduced series resistance, an increased on state drain current (I on) and a large normalized I DS. Furthermore, the structure can also improve corner effect and reduce self-heating effect due to the extended body. Our results show that the EBFinFET is excellent for nanoscale device.

Keywords: SOI, FinFET, tri-gate, self-heating effect.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1077756

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References:


[1] D. Hisamoto,W.-C. Lee, J.Kedzierski,H. Takeuchi, K. Asano, C.Kuo, E. Anderson, T.-J. King, J.Bokor,and C. Hu, "FinFETÔÇöA Self-Aligned Double-Gate MOSFETScalable to 20 nm,"IEEE Trans. Electron Devices, vol. 47, no. 12, pp. 2320-2325, Dec. 2000.
[2] X. Huang, W.-C. Lee,C.Kuo, D.Hisamoto, Member,L. Chang, J.Kedzierski, E. Anderson, H. Takeuchi, Y.-K. Choi,K. Asano, V. Subramanian, T.-J. King, J.Bokor,and C. Hu,"Sub-50 nm P-Channel FinFET," IEEE Trans. Electron Devices, vol. 48, no. 5, pp. 880-886, May 2001.
[3] A. A. Orouji, and M. Mehrad,"A New Rounded Edge Fin Field Effect Transistor for Improving Self-Heating Effects," Japanese Journal of Applied Physics, vol. 50 , pp. 124303-1-6, 2011.
[4] M.Mehrad and A. A. Orouji,"Partially Cylindrical Fin Field-Effect Transistor:A Novel Device for Nanoscale Applications,"IEEE Trans. Electron Devices and Materials Reliability, vol. 10, no.2, pp. 271-275, June 2010.
[5] L. Mathew, M. Sadd, S. Kalpat, M. Zavala, T. Stephens, R. Mora, S. Bagchi, C. Parker, J. Vasek, D. Sing, R. Shimer, L. Prabhu, G.O. Workman, G. Ablen,Z.Shi, J.Saenz , B. Min, D. Burnett, B.-Y. Nguyen, J. Mogab., M.M. Chowdhury, W. Zhang,J.G. Fossum,"Inverted T channel FET (ITFET)- Fabrication andcharacteristics of vertical-horizontal, thin body,multigate, multi-orientationdevices, ITFET SRAM bit-cell operation.A novel technology for 45nm and beyond CMOS," inIEDM Tech. Dig., pp. 713- 716, 2005.
[6] X.Xu, R. Wang, R. Huang, J.Zhuge,G. Chen, X. Zhang,and Y. Wang,"High-Performance BOI FinFETs Basedon Bulk-Silicon Substrate,"IEEE Trans. Electron Devices, vol. 55, no. 11, pp. 3246- 3250, Nov. 2008.
[7] M.Shrivastava,M. S.Baghini,D. K. Sharma, and V. R.Rao,"A Novel Bottom Spacer FinFET StructureforImprovedShort- Channel, Power-Delay, and Thermal Performance,"IEEE Trans. Electron Devices, vol. 57, no. 6, pp. 1287-1293, June 2010.
[8] X. Sun, V. Moroz, N.Damrongplasit,C. Shin, and T.-J. King Liu, "Variation Study of the Planar Ground-Plane BulkMOSFET, SOI FinFET, and TrigateBulk MOSFET Designs,"IEEE Trans. Electron Devices, vol. 58, no. 10, pp. 3294-3299, Oct. 2011.
[9] Y.-C.Eng, J.-T. Lin, C.-H.Kuo,P.-H. Lin, Y.-H. Fan, and H.-H. Chen,"Numerical Study of a Highly Scaled Bulk MOSFETWith Block Oxide and Source/Drain-Tied Structure,"IEEE Trans. Electron Devices, vol. 58, no.5, pp. 1381-1387, 2011.
[10] User-s manual, ISE TCAD, 2004.