Continuity Microplating using Image Processing
Commenced in January 2007
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Continuity Microplating using Image Processing

Authors: Ting-Chao Chen, Yean-Ren Hwang, Jing-Chie Lin

Abstract:

A real time image-guided electroplating system is proposed in this paper. Unlike previous electroplating systems, instead of using the intermittent mode to electroplate 500um long copper specimen, a CCD camera and a motion controller are used to adjust anode-cathode distance to obtain better results. Since the image of the gap distance is highly deteriorated due to complex chemical-electrical operation inside the electrolyte, to determine the gap distance, an image processing algorithm is developed and mainly based on the entropy and energy values. In addition, the color and incidence direction of light source are also discussed to help the image process in this paper. From the experiment results, the specimens created by the proposed system show better structure, better uniformity and better finishing surface compared to those by previous intermittent electroplating setup.

Keywords: Electroplating, image guided, image process, light source.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1329591

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