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Surface Modification by EUV laser Beam based on Capillary Discharge
Abstract:Many applications require surface modification and micro-structuring of polymers. For these purposes is mainly used ultraviolet (UV) radiation from excimer lamps or excimer lasers. However, these sources have a decided disadvantage - degrading the polymer deep inside due to relatively big radiation penetration depth which may exceed 100 μm. In contrast, extreme ultraviolet (EUV) radiation is absorbed in a layer approximately 100 nm thick only. In this work, the radiation from a discharge-plasma EUV source (with wavelength 46.9 nm) based on a capillary discharge driver is focused with a spherical Si/Sc multilayer mirror for surface modification of PMMA sample or thin gold layer (thickness about 40 nm). It was found that the focused EUV laser beam is capable by one shot to ablate PMMA or layer of gold, even if the focus is significantly influenced by astigmatism.
Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1063164Procedia APA BibTeX Chicago EndNote Harvard JSON MLA RIS XML ISO 690 PDF Downloads 1275
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