Investigation of Monochromatization Light Effect at Molecular/Atomic Level in Electronegative-Electropositive Gas Mixtures Plasma

Authors: L.C. Ciobotaru

Abstract:

In electronegative-electropositive gas mixtures plasma, at a total pressure varying in the range of ten to hundred Torr, the appearance of a quasi-mochromatization effect of the emitted radiation was reported. This radiation could be the result of the generating mechanisms at molecular level, which is the case of the excimer radiation but also at atomic level. Thus, in the last case, in (Ne+1%Ar/Xe+H2) gas mixtures plasma in a dielectric barrier discharge, this effect, called M-effect, consists in the reduction of the discharge emission spectrum practice at one single, strong spectral line with λ = 585.3 nm. The present paper is concerned with the characteristics comparative investigation of the principal reaction mechanisms involved in the quasi-monochromatization effect existence in the case of the excimer radiation, respectively of the Meffect. Also, the paper points out the role of the metastable electronegative atoms in the appearance of the monochromatization – effect at atomic level.

Keywords: Colombian forces, Direct Harpoon reaction, Monochromatization – effect, Resonant polar three-body reaction.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1081475

References:

[1] Xiangfen Feng and Shaolong Zhu, "Investigation of excimer ultraviolet sources from dielectric barrier discharge in krypton and halogen mixtures", Phys. Scr., 74 322-325, (2006)
[2] F Adler and S Muller, "Formation and decay mechanisms of excimer molecules in dielectric barrier discharges",J. Phys. D: Appl. Phys., 33 1705-1715, (2000)
[3] Jun-Ying Zhang, Ian W. Boyd, "Efficient excimer ultraviolet sources from a dielectric barrier discharge in rare-gas/halogen mixtures", J. Appl. Phys., 80(2), 633, (1996)
[4] Jun-Ying Zhang, Ian W. Boyd, "Efficient XeI* excimer ultraviolet sources from a dielectric barrier discharge", J. Appl. Phys., 84(3), 1174,(1998)
[5] Paul Barnes, Mark Kushner, " Formation of XeI(B) in low pressure inductive radio frequency electric discharges sustained in mixtures of Xe and I2 ", Journal of Applied Physics , 80(10),5593, (1996)
[6] Paul Barnes, Mark Kushner, "Ion-ion neutralization of iodine in radiofrequency inductive discharges of Xe and I2 mixtures", Journal of Applied Physics, 82(5), 2150, (1997)
[7] Qu Qiongrong, Meng Yuedong, Shu Xingsheng, Zhong Shaofeng, You Qingliang, Plasma Science & Technology, 8(3), 333 (2006).
[8] A. K. Shuaibov and I. V. Shevera, Optics and Spectroscopy, 104(4), 534-539, ( 2008)
[9] Ciobotaru, L.C., Chiru, P, Neacsu, C, Musa, G., “PDP type barrier discharge ultraviolet radiation source“, Journal of Optoelectron. Adv. Mater., 6 (1), 321-324, (2004)
[10] G. Musa, L.C. Ciobotaru, Barbu Ionut, “The M-effect in A.C/DC discharges in He+O2/Cl2 gas mixtures “, J. Optoelectron. Adv. Mater. 8 (3), 1292, (2006)
[11] G. Musa, A. Popescu, A. Baltog, C. P. Lungu, “M-Effect, Monochromatisation of the radiation of discharges in multiple gas mixtures”, Romanian Reports in Physics, 45(3/4), 287, (1993)
[12] G. Musa, L.C. Ciobotaru,” New considerations on mechanisms involved in M-effect in electropositive-electronegative gas mixtures”, Optoelectron. Adv. Mater. - Rapid Commun, 1(3), 137 (2007)
[13] L.C. Ciobotaru, G..Musa, “Monochromatisation - Effect Kinetic Model for Penning Gas Mixtures Emission Mechanisms”, Turkish Journal of Physics, 36 (1), 77-85, (2012)
[14] L. Landau, Phys., Z. Sowjet, 46, 221, (1932)
[15] C. Zener, Proceedings of Royal Society A, 137, 696, (1932)
[16] R. Vladoiu, M. Contulov, A. Mandes, G. Musa, ”The double M-effect induced by noble gases activated with negative ions”, European Physical Journal D, 54(2), 287 (2009)
[17] R. Vladoiu, M. Contulov, V. Ciupina, G. Musa, “ Multiple M-Effect Signal in Noble Gases and Hydrogen Mixture Discharge”, Contributions to Plasma Physics, 50(2), 177, (2010)
[18] OU Qiongrong, MENG Yuedong, SHU Xingsheng, Zhong Shaofeng, YOU Qingliang, “Influence of Iodine Vapour Pressure on Formation of XeI * in Xe/ I2 Mixture”, Plasma Science & Technology, 8 (3), 333, (2006)