Commenced in January 2007
Frequency: Monthly
Edition: International
Paper Count: 3

UV light Related Abstracts

3 Photocatalytic Degradation of Aqueous Organic Pollutant under UV Light Irradiation

Authors: D. Tassalit, N. Chekir, O. Benhabiles, N. A. Laoufi, F. Bentahar

Abstract:

In the setting of the waters purification, some molecules appear recalcitrant to the traditional treatments. The exploitation of the properties of some catalysts permits to amplify the oxidization performances with ultraviolet radiance and to remove this pollution by a non biological way. This study was conducted to investigate the effect of a photocatalysis oxidation system for organic pollutants treatment using a new reactor design and ZnO/TiO2 as a catalyst under UV light. Oxidative degradation of tylosin by hydroxyl radicals (OH°) was studied in aqueous medium using suspended forms of ZnO and TiO2. The results improve that the treatment was affected by many factors such as flow-rate of solution, initial pollutant concentration and catalyst concentration. The rate equation for the tylosin degradation followed first order kinetics and the rate-constants were determined. The reaction rate fitted well with Langmuir–Hinshelwood model and the removed ratio of tylosin was 97 % in less than 60 minutes. To determine the optimum catalyst loading, a series of experiments were carried out by varying the amount of catalyst from 0.05 to 0.5 g/L. The results demonstrate that the rate of photodegradation is optimum with catalyst loading of 0.1 g/L, reaction flow rate of 3.79 mL/s and solution natural pH. The rate was found to increase with the decrease in tylosin concentration from 30 to 5 mg/L. Therefore, this simple photoreactor design for the removal of organic pollutants has the potential to be used in wastewater treatment.

Keywords: wastewater treatment, photocatalysis, ZnO, TiO2, advanced oxidation, UV light, pharmaceuticals pollutants, Spiramycin, tylosin

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2 Reflector Arrangement Effect on Ultraviolet Lamp Performance by CFX Simulation

Authors: William Sidharta, Chin-Tu Lu

Abstract:

Fluorescent ultraviolet lamp generates ultraviolet light which is commonly used in industrial field with certain purposes especially for curing process. Due to the value of inefficiency, there are changes in energy from electrical energy to the heat energy and this would make a defect on the industrial product caused by high temperature of lamp tube during ultraviolet light emission. The condition of industrial scale is further worsening, since commonly using dozens of fluorescent ultraviolet lamps to support huge production process and then it will generates much more heat energy. The maximum temperature of fluorescent ultraviolet lamp will get affected by arranging the lamp tube reflector and this study presents CFX simulation results of the maximum lamp tube temperature with some different reflector arrangements on purely natural convection phenomena. There exists certain spaces value of the reflector and the lamp tube to obtaining lower maximum temperature of the fluorescent ultraviolet lamp.

Keywords: UV light, CFX simulation, fluorescent UV lamp, lamp tube reflector

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1 Induction of Adaptive Response in Yeast Cells under Influence of Extremely High Frequency Electromagnetic Field

Authors: Sergei Voychuk

Abstract:

Introduction: Adaptive response (AR) is a manifestation of radiation hormesis, which deal with the radiation resistance that may be increased with the pretreatment with small doses of radiation. In the current study, we evaluated the potency of radiofrequency EMF to induce the AR mechanisms and to increase a resistance to UV light. Methods: Saccharomyces cerevisiae yeast strains, which were created to study induction of mutagenesis and recombination, were used in the study. The strains have mutations in rad2 and rad54 genes, responsible for DNA repair: nucleotide excision repair (PG-61), postreplication repair (PG-80) and mitotic (crossover) recombination (T2). An induction of mutation and recombination are revealed due to the formation of red colonies on agar plates. The PG-61 and T2 are UV sensitive strains, while PG-80 is sensitive to ionizing radiation. Extremely high frequency electromagnetic field (EHF-EMF) was used. The irradiation was performed in floating mode and frequency changed during exposure from 57 GHz to 62 GHz. The power of irradiation was 100 mkW, and duration of exposure was 10 and 30 min. Treatment was performed at RT and then cells were stored at 28° C during 1 h without any exposure but after that they were treated with UV light (254nm) for 20 sec (strain T2) and 120 sec (strain PG-61 and PG-80). Cell viability and quantity of red colonies were determined after 5 days of cultivation on agar plates. Results: It was determined that EHF-EMF caused 10-20% decrease of viability of T2 and PG-61 strains, while UV showed twice stronger effect (30-70%). EHF-EMF pretreatment increased T2 resistance to UV, and decreased it in PG-61. The PG-80 strain was insensitive to EHF-EMF and no AR effect was determined for this strain. It was not marked any induction of red colonies formation in T2 and PG-80 strain after EHF or UV exposure. The quantity of red colonies was 2 times more in PG-61 strain after EHF-EMF treatment and at least 300 times more after UV exposure. The pretreatment of PG-61 with EHF-EMF caused at least twice increase of viability and consequent decrease of amount of red colonies. Conclusion: EHF-EMF may induce AR in yeast cells and increase their viability under UV treatment.

Keywords: Adaptive Response, Saccharomyces cerevisiae, UV light, EHF-EMF

Procedia PDF Downloads 169