%0 Journal Article
	%A Binay K. Dutta and  Tayseir M. Abd Ellateif and  Saikat Maitra
	%D 2011
	%J International Journal of Chemical and Molecular Engineering
	%B World Academy of Science, Engineering and Technology
	%I Open Science Index 49, 2011
	%T Development of a Porous Silica Film by Sol-gel Process
	%U https://publications.waset.org/pdf/6677
	%V 49
	%X In the present work homogeneous silica film on
silicon was fabricated by colloidal silica sol. The silica sol precursor
with uniformly granular particle was derived by the alkaline
hydrolysis of tetraethoxyorthosilicate (TEOS) in presence of glycerol
template. The film was prepared by dip coating process. The
templated hetero-structured silica film was annealed at elevated
temperatures to generate nano- and meso porosity in the film. The
film was subsequently annealed at different temperatures to make it
defect free and abrasion resistant. The sol and the film were
characterized by the measurement of particle size distribution,
scanning electron microscopy, XRD, FTIR spectroscopy,
transmission electron microscopy, atomic force microscopy,
measurement of the refractive index, thermal conductivity and
abrasion resistance. The porosity of the films decreased whereas
refractive index and dielectric constant of it `increased with the
increase in the annealing temperature. The thermal conductivity of
the films increased with the increase in the film thickness. The
developed porous silica film holds strong potential for use in
different areas.
	%P 34 - 38