Z. X. Chen and  N. Singh and  D.-L. Kwong,  Vertical Silicon Nanowire MOSFET With A Fully-Silicided (FUSI) NiSi2 Gate.   journal   = {International Journal of Electronics and Communication Engineering}, [online]. World Academy of Science, Engineering and Technology.
    September 2011, vol. 57(9). 1229 - 1231
    [viewed 29 September 2020]. Available from: https://publications.waset.org/pdf/14024.