WASET
	@article{(Open Science Index):https://publications.waset.org/pdf/10002058,
	  title     = {Nanoindentation of Thin Films Prepared by Physical Vapor Deposition},
	  author    = {Dhiflaoui Hafedh and  Khlifi Kaouthar and  Ben Cheikh Larbi Ahmed},
	  country	= {},
	  institution	= {},
	  abstract     = {These Monolayer and multilayer coatings of CrN and
AlCrN deposited on 100Cr6 (AISI 52100) substrate by PVD
magnetron sputtering system. The microstructures of the coatings
were characterized using atomic force microscopy (AFM). The AFM
analysis revealed the presence of domes and craters that are
uniformly distributed over all surfaces of the various layers.
Nanoindentation measurement of CrN coating showed maximum
hardness (H) and modulus (E) of 14 GPa and 190 GPa, respectively.
The measured H and E values of AlCrN coatings were found to be 30
GPa and 382 GPa, respectively. The improved hardness in both the
coatings was attributed mainly to a reduction in crystallite size and
decrease in surface roughness. The incorporation of Al into the CrN
coatings has improved both hardness and Young’s modulus.},
	    journal   = {International Journal of Materials and Metallurgical Engineering},
	  volume    = {9},
	  number    = {2},
	  year      = {2015},
	  pages     = {368 - 371},
	  ee        = {https://publications.waset.org/pdf/10002058},
	  url   	= {https://publications.waset.org/vol/98},
	  bibsource = {https://publications.waset.org/},
	  issn  	= {eISSN: 1307-6892},
	  publisher = {World Academy of Science, Engineering and Technology},
	  index 	= {Open Science Index 98, 2015},
	}