N. V. Toan and  S. Sangu and  T. Saitoh and  N. Inomata and  T. Ono,  High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator.   journal   = {International Journal of Physical and Mathematical Sciences}, [online]. World Academy of Science, Engineering and Technology.
    April 2015, vol. 101(5). 481 - 486
    [viewed 25 April 2024]. Available from: https://publications.waset.org/pdf/10001243.