@article{(Open Science Index):https://publications.waset.org/pdf/9457,
	  title     = {Influence of Thermo-fluid-dynamic Parameters on Fluidics in an Expanding Thermal Plasma Deposition Chamber},
	  author    = {G. Zuppardi and  F. Romano},
	  country	= {},
	  institution	= {},
	  abstract     = {Technology of thin film deposition is of interest in
many engineering fields, from electronic manufacturing to corrosion
protective coating. A typical deposition process, like that developed
at the University of Eindhoven, considers the deposition of a thin,
amorphous film of C:H or of Si:H on the substrate, using the
Expanding Thermal arc Plasma technique. In this paper a computing
procedure is proposed to simulate the flow field in a deposition
chamber similar to that at the University of Eindhoven and a
sensitivity analysis is carried out in terms of: precursor mass flow
rate, electrical power, supplied to the torch and fluid-dynamic
characteristics of the plasma jet, using different nozzles. To this
purpose a deposition chamber similar in shape, dimensions and
operating parameters to the above mentioned chamber is considered.
Furthermore, a method is proposed for a very preliminary evaluation
of the film thickness distribution on the substrate. The computing
procedure relies on two codes working in tandem; the output from
the first code is the input to the second one. The first code simulates
the flow field in the torch, where Argon is ionized according to the
Saha-s equation, and in the nozzle. The second code simulates the
flow field in the chamber. Due to high rarefaction level, this is a
(commercial) Direct Simulation Monte Carlo code. Gas is a mixture
of 21 chemical species and 24 chemical reactions from Argon plasma
and Acetylene are implemented in both codes. The effects of the
above mentioned operating parameters are evaluated and discussed
by 2-D maps and profiles of some important thermo-fluid-dynamic
parameters, as per Mach number, velocity and temperature. Intensity,
position and extension of the shock wave are evaluated and the
influence of the above mentioned test conditions on the film
thickness and uniformity of distribution are also evaluated.},
	    journal   = {International Journal of Aerospace and Mechanical Engineering},
	  volume    = {4},
	  number    = {11},
	  year      = {2010},
	  pages     = {1303 - 1313},
	  ee        = {https://publications.waset.org/pdf/9457},
	  url   	= {https://publications.waset.org/vol/47},
	  bibsource = {https://publications.waset.org/},
	  issn  	= {eISSN: 1307-6892},
	  publisher = {World Academy of Science, Engineering and Technology},
	  index 	= {Open Science Index 47, 2010},
	}