A Simulation Model for the H-gate PDSOI MOSFET
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A Simulation Model for the H-gate PDSOI MOSFET

Authors: Bu Jianhui, Bi Jinshun, Liu Mengxin, Luo Jiajun, Han Zhengsheng

Abstract:

The floating body effect is a serious problem for the PDSOI MOSFET, and the H-gate layout is frequently used as the body contact to eliminate this effect. Unfortunately, most of the standard commercial SOI MOSFET model is for the device with finger gate, the necessity of the new models for the H-gate device arises. A simulation model for the H-gate PDSOI MOSFET is proposed based on the 0.35μm PDSOI process developed by the Institute of Microelectronics of the Chinese Academy of Sciences (IMECAS), and then the model is well verified by the ring-oscillator.

Keywords: PDSOI H-gate Device model Body contact.

Digital Object Identifier (DOI): doi.org/10.5281/zenodo.1070445

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References:


[1] C. Chun-Yen, et al. Reduced reverses narrow channel effect in thin SOI nMOSFETs. Electron Device Letters, IEEE, 2000,vol. 21, pp. 460-462
[2] A. Daghighi and M. A. Osman. Two-dimensional model for investigating body contact structures in PD SOI MOSFETs. Microelectronic Engineering, 2003, vol. 70, pp. 83-92
[3] C. Xiaowu and H. Chaohe. Study of body contact of partial depleted SOI NMOS devices. 8th International Conference on Solid-State and Integrated Circuit Technology, 2006, pp. 212-214.
[4] BSIMSOIv4.4 MOSFET MODEL Users- Manual, Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA 94720.
[5] P. Su, S. K H. Fug, et al. A Body-Contact SO1 MOSFET Model for Circuit Simulation. 1999 IEEE International SO1 Conference, 1999, pp.50-51
[6] M. Mochizuki, et al. Accurate and global model of SOI H gate body-tied MOSFET for circuit simulator.2011 International conference on Simulation of Process and Device.2011,pp.247-250