%0 Journal Article
	%A N. Shen and  T. T. Le and  H. Y. Yu and  Z. X. Chen and  K. T. Win and  N. Singh and  G. Q. Lo and  D. -L. Kwong
	%D 2011
	%J International Journal of Materials and Metallurgical Engineering
	%B World Academy of Science, Engineering and Technology
	%I Open Science Index 57, 2011
	%T Fabrication and Characterization of Poly-Si Vertical Nanowire Thin Film Transistor
	%U https://publications.waset.org/pdf/4635
	%V 57
	%X In this paper, we present a vertical nanowire thin film transistor with gate-all-around architecture, fabricated using CMOS compatible processes. A novel method of fabricating polysilicon vertical nanowires of diameter as small as 30 nm using wet-etch is presented. Both n-type and p-type vertical poly-silicon nanowire transistors exhibit superior electrical characteristics as compared to planar devices. On a poly-crystalline nanowire of 30 nm diameter, high Ion/Ioff ratio of 106, low drain-induced barrier lowering (DIBL) of 50 mV/V, and low sub-threshold slope SS~100mV/dec are demonstrated for a device with channel length of 100 nm.

	%P 798 - 800