%0 Journal Article
	%A S. Sobhanian and  H. Naghshara and  N. Sadeghi and  S. Khorram
	%D 2011
	%J International Journal of Physical and Mathematical Sciences
	%B World Academy of Science, Engineering and Technology
	%I Open Science Index 50, 2011
	%T The Buffer Gas Influence Rate on Absolute Cu Atoms Density with regard to Deposition
	%U https://publications.waset.org/pdf/13895
	%V 50
	%X The absolute Cu atoms density in Cu(2S1/22P1/2)
ground state has been measured by Resonance Optical Absorption
(ROA) technique in a DC magnetron sputtering deposition with
argon. We measured these densities under variety of operation
conditions: pressure from 0.6 μbar to 14 μbar, input power from
10W to 200W and N2 mixture from 0% to 100%. For measuring the
gas temperature, we used the simulation of N2 rotational spectra
with a special computer code. The absolute number density of Cu
atoms decreases with increasing the N2 percentage of buffer gas at
any conditions of this work. But the deposition rate, is not decreased
with the same manner. The deposition rate variation is very small
and in the limit of quartz balance measuring equipment accuracy. So
we conclude that decrease in the absolute number density of Cu
atoms in magnetron plasma has not a big effect on deposition rate,
because the diffusion of Cu atoms to the chamber volume and
deviation of Cu atoms from direct path (towards the substrate)
decreases with increasing of N2 percentage of buffer gas. This is
because of the lower mass of N2 atoms compared to the argon ones.
	%P 104 - 106