{"title":"Investigation of Monochromatization Light Effect at Molecular\/Atomic Level in Electronegative-Electropositive Gas Mixtures Plasma","authors":"L.C. Ciobotaru","volume":71,"journal":"International Journal of Physical and Mathematical Sciences","pagesStart":1552,"pagesEnd":1557,"ISSN":"1307-6892","URL":"https:\/\/publications.waset.org\/pdf\/13625","abstract":"
In electronegative-electropositive gas mixtures plasma, at a total pressure varying in the range of ten to hundred Torr, the appearance of a quasi-mochromatization effect of the emitted radiation was reported. This radiation could be the result of the generating mechanisms at molecular level, which is the case of the excimer radiation but also at atomic level. Thus, in the last case, in (Ne+1%Ar\/Xe+H2) gas mixtures plasma in a dielectric barrier discharge, this effect, called M-effect, consists in the reduction of the discharge emission spectrum practice at one single, strong spectral line with λ = 585.3 nm. The present paper is concerned with the characteristics comparative investigation of the principal reaction mechanisms involved in the quasi-monochromatization effect existence in the case of the excimer radiation, respectively of the Meffect. Also, the paper points out the role of the metastable electronegative atoms in the appearance of the monochromatization – effect at atomic level.<\/p>\r\n","references":"[1] Xiangfen Feng and Shaolong Zhu, \"Investigation of excimer ultraviolet sources from dielectric barrier discharge in krypton and\r\nhalogen mixtures\", Phys. Scr., 74 322-325, (2006)\r\n[2] F Adler and S Muller, \"Formation and decay mechanisms of excimer\r\nmolecules in dielectric barrier discharges\",J. Phys. D: Appl. Phys., 33 1705-1715, (2000)\r\n[3] Jun-Ying Zhang, Ian W. Boyd, \"Efficient excimer ultraviolet sources\r\nfrom a dielectric barrier discharge in rare-gas\/halogen mixtures\", J.\r\nAppl. Phys., 80(2), 633, (1996)\r\n[4] Jun-Ying Zhang, Ian W. Boyd, \"Efficient XeI* excimer ultraviolet\r\nsources from a dielectric barrier discharge\", J. Appl. Phys., 84(3), 1174,(1998)\r\n[5] Paul Barnes, Mark Kushner, \" Formation of XeI(B) in low pressure\r\ninductive radio frequency electric discharges sustained in mixtures of Xe and I2 \", Journal of Applied Physics , 80(10),5593, (1996)\r\n[6] Paul Barnes, Mark Kushner, \"Ion-ion neutralization of iodine in radiofrequency\r\ninductive discharges of Xe and I2 mixtures\", Journal of\r\nApplied Physics, 82(5), 2150, (1997)\r\n[7] Qu Qiongrong, Meng Yuedong, Shu Xingsheng, Zhong Shaofeng, You\r\nQingliang, Plasma Science & Technology, 8(3), 333 (2006).\r\n[8] A. K. Shuaibov and I. V. Shevera, Optics and Spectroscopy, 104(4),\r\n534-539, ( 2008)\r\n[9] Ciobotaru, L.C., Chiru, P, Neacsu, C, Musa, G., \u201cPDP type barrier\r\ndischarge ultraviolet radiation source\u201c, Journal of Optoelectron. Adv.\r\nMater., 6 (1), 321-324, (2004)\r\n[10] G. Musa, L.C. Ciobotaru, Barbu Ionut, \u201cThe M-effect in A.C\/DC\r\ndischarges in He+O2\/Cl2 gas mixtures \u201c, J. Optoelectron. Adv. Mater. 8\r\n(3), 1292, (2006)\r\n[11] G. Musa, A. Popescu, A. Baltog, C. P. Lungu, \u201cM-Effect,\r\nMonochromatisation of the radiation of discharges in multiple gas\r\nmixtures\u201d, Romanian Reports in Physics, 45(3\/4), 287, (1993)\r\n[12] G. Musa, L.C. Ciobotaru,\u201d New considerations on mechanisms\r\ninvolved in M-effect in electropositive-electronegative gas mixtures\u201d,\r\nOptoelectron. Adv. Mater. - Rapid Commun, 1(3), 137 (2007)\r\n[13] L.C. Ciobotaru, G..Musa, \u201cMonochromatisation - Effect Kinetic Model\r\nfor Penning Gas Mixtures Emission Mechanisms\u201d, Turkish Journal of\r\nPhysics, 36 (1), 77-85, (2012)\r\n[14] L. Landau, Phys., Z. Sowjet, 46, 221, (1932)\r\n[15] C. Zener, Proceedings of Royal Society A, 137, 696, (1932)\r\n[16] R. Vladoiu, M. Contulov, A. Mandes, G. Musa, \u201dThe double M-effect\r\ninduced by noble gases activated with negative ions\u201d, European\r\nPhysical Journal D, 54(2), 287 (2009)\r\n[17] R. Vladoiu, M. Contulov, V. Ciupina, G. Musa, \u201c Multiple M-Effect\r\nSignal in Noble Gases and Hydrogen Mixture Discharge\u201d,\r\nContributions to Plasma Physics, 50(2), 177, (2010)\r\n[18] OU Qiongrong, MENG Yuedong, SHU Xingsheng, Zhong Shaofeng,\r\nYOU Qingliang, \u201cInfluence of Iodine Vapour Pressure on Formation of\r\nXeI * in Xe\/ I2 Mixture\u201d, Plasma Science & Technology, 8 (3), 333,\r\n(2006)","publisher":"World Academy of Science, Engineering and Technology","index":"Open Science Index 71, 2012"}