@article{(Open Science Index):https://publications.waset.org/pdf/10010857, title = {A Design of Anisotropic Wet Etching System to Reduce Hillocks on Etched Surface of Silicon Substrate}, author = {Alonggot Limcharoen Kaeochotchuangkul and Pathomporn Sawatchai}, country = {}, institution = {}, abstract = {This research aims to design and build a wet etching system, which is suitable for anisotropic wet etching, in order to reduce etching time, to reduce hillocks on the etched surface (to reduce roughness), and to create a 45-degree wall angle (micro-mirror). This study would start by designing a wet etching system. There are four main components in this system: an ultrasonic cleaning, a condenser, a motor and a substrate holder. After that, an ultrasonic machine was modified by applying a condenser to maintain the consistency of the solution concentration during the etching process and installing a motor for improving the roughness. This effect on the etch rate and the roughness showed that the etch rate increased and the roughness was reduced. }, journal = {International Journal of Industrial and Manufacturing Engineering}, volume = {13}, number = {11}, year = {2019}, pages = {695 - 698}, ee = {https://publications.waset.org/pdf/10010857}, url = {https://publications.waset.org/vol/155}, bibsource = {https://publications.waset.org/}, issn = {eISSN: 1307-6892}, publisher = {World Academy of Science, Engineering and Technology}, index = {Open Science Index 155, 2019}, }