WASET
    N. V. Toan and  S. Sangu and  T. Saitoh and  N. Inomata and  T. Ono,  High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator.   journal   = {International Journal of Physical and Mathematical Sciences}, [online]. World Academy of Science, Engineering and Technology.
    April 2015, vol. 101(5). 481 - 486
    [viewed 21 September 2024]. Available from: https://publications.waset.org/pdf/10001243.