N. V. Toan and S. Sangu and T. Saitoh and N. Inomata and T. Ono, High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator. journal = {International Journal of Physical and Mathematical Sciences}, [online]. World Academy of Science, Engineering and Technology. April 2015, vol. 101(5). 481 - 486 [viewed 21 September 2024]. Available from: https://publications.waset.org/pdf/10001243.