%0 Journal Article
	%A N. V. Toan and  S. Sangu and  T. Saitoh and  N. Inomata and  T. Ono
	%D 2015
	%J International Journal of Physical and Mathematical Sciences
	%B World Academy of Science, Engineering and Technology
	%I Open Science Index 101, 2015
	%T High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator
	%U https://publications.waset.org/pdf/10001243
	%V 101
	%X This paper presents the design and fabrication of an
optical window for an optical modulator toward image sensing
applications. An optical window consists of micrometer-order SiO2
capillaries (porous solid) that can modulate transmission light
intensity by moving the liquid in and out of porous solid. A high
optical transmittance of the optical window can be achieved due to
refractive index matching when the liquid is penetrated into the
porous solid. Otherwise, its light transmittance is lower because of
light reflection and scattering by air holes and capillary walls. Silicon
capillaries fabricated by deep reactive ion etching (DRIE) process are
completely oxidized to form the SiO2 capillaries. Therefore, high
aspect ratio SiO2 capillaries can be achieved based on silicon
capillaries formed by DRIE technique. Large compressive stress of
the oxide causes bending of the capillary structure, which is reduced
by optimizing the design of device structure. The large stress of the
optical window can be released via thin supporting beams. A 7.2 mm
x 9.6 mm optical window area toward a fully integrated with the
image sensor format is successfully fabricated and its optical
transmittance is evaluated with and without inserting liquids (ethanol
and matching oil). The achieved modulation range is approximately
20% to 35% with and without liquid penetration in visible region
(wavelength range from 450 nm to 650 nm).

	%P 481 - 486